Atomic force microscopy (AFM) measures film thickness and examines surface topography. The statistical analysis of variance (ANOVA) technique is applied to assess temperature effects and validate AFM findings.
了解详细信息：Atomic force microscopy (AFM) measures film thickness and examines surface topography. The statistical analysis of variance (ANOVA) technique is applied to assess temperature effects and validate AFM findings.
www.sciencedirect.com/science/article/pii/S277301…We experimentally study the surface roughness and the lateral friction force in single-layer MoS 2 crystals deposited on different substrates: SiO 2, mica, and hexagonal boron nitride (h-BN). Roughness and sliding friction measurements are performed by atomic force microscopy.
pubs.aip.org/aip/apl/article/105/5/053111/378043/S…This study was on the optoelectronic properties of multilayered two-dimensional MoS2 and WS2 materials on a silicon substrate using sputtering physical vapor deposition (PVD) and chemical vapor...
www.researchgate.net/figure/AFM-roughness-para…The root-mean-square (RMS) surface roughness of such feature-less regions, measured in a number of topographical images taken in different locations and with different scan sizes, is 4.1±0.3 Å, with little dependence on image size.
www.sciencedirect.com/science/article/pii/S016943…AFM investigation method, taking into account with the known features of MoS 2 anisotropic structure can be used for the analysis of molybdenum disulfide thin films.
iopscience.iop.org/article/10.1088/1757-899X/387/…- 其他用户还问了以下问题
Atomic force microscopic investigations of MoS2 thin films produced by low pressure sulfurization
- 已发布: 2022/10/01
- DOI: 10.1016/j.micrna.2022.207400
- 引用者: 0
- Keywords: Atomic force microscopy; Grain size; MoS2; St…
Molybdenum disulfide (MoS2) thin films were produced on Si/SiO2 substrate by low pressure sulfurization of molybdenum (Mo) film. Mo films are treated with sulfur vapor at different temperatures to investigate the effect of growth temperature on the structural and morphological features of MoS2 films...Single-layer MoS2 roughness and sliding friction quenching by ...
2014年8月7日 · We experimentally study the surface roughness and the lateral friction force in single-layer MoS 2 crystals deposited on different substrates: SiO 2, mica, and hexagonal …
AFM roughness parameters of MoS 2 and WS 2 samples.
This study was on the optoelectronic properties of multilayered two-dimensional MoS2 and WS2 materials on a silicon substrate using sputtering physical vapor deposition (PVD) and chemical …
An AFM study of the topography of natural MoS2 following …
1999年9月1日 · The root-mean-square (RMS) surface roughness of such feature-less regions, measured in a number of topographical images taken in different locations and with different …
2019年6月27日 · AFM investigation method, taking into account with the known features of MoS 2 anisotropic structure can be used for the analysis of molybdenum disulfide thin films.
(a) AFM surface profile of the annealed MoS 2 thin film …
The thickness of MoS2 films is estimated at around 2.8 ± 0.44 nm and 3.2 ± 0.43 nm (∼6 layers) using atomic force microscopy analysis.
Improving the atomic-resolution AFM imaging of monolayer …
2019年4月12日 · However, correctly controlled tip–sample distances can motivate larger radius tips to reproduce the similar iamging quality in detail for smaller radius tips. This study sheds …
Atomic force microscopic investigations of MoS2 thin
2022年9月1日 · Atomic force microscopy (AFM) measures film thickness and examines surface topography. The statistical analysis of variance (ANOVA) technique is applied to assess …
Single-layer MoS2 roughness and sliding friction quenching by ...
2014年7月8日 · Roughness and sliding friction measurements are performed by atomic force microscopy (AFM). We find a strong dependence of the MoS2 roughness on the underlying …
Atomic Layer Deposition of Crystalline …
2017年3月30日 · The small grain size and considerable roughness make it difficult to determine from the SEM and AFM images when a continuous or closed film is formed, and …
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