Recently, advanced tungsten-metal (W-M) composites have been developed to improve their ballistic penetration, but the corrosion properties are unknown and need to be determined. In this work, the galvanic corrosion behavior of W coupled …

To minimize galvanic corrosion, select fasteners based on their material compatibility with the substrates. The closer together the material are on the chart to the right, the less galvanic action will

2024年5月20日 · Tungsten Galvanic Corrosion. Like titanium and platinum, tungsten also leans towards the cathodic side of the galvanic series, though it can corrode fast when coupled with less reactive metal, its degradation is less with more anodic elements. The tungsten metal alloys, especially tungsten carbide, are highly corrosion-resistant.

2021年6月28日 · Metal loss on the sidewall is due to galvanic corrosion that occurs when two metals are in contact with each other in an aqueous solution, as reported in another study. 10 To understand this phenomenon, potentiodynamic polarization measurements for W, WN, and TiN were performed in slurry A and slurry B to confirm equilibrium potential and ...

The corrosion behaviour of tungsten and high-density tungsten alloys (W a 90 weight %) has been examined electrochemically through anodic polarization measurements, instantaneous corrosion rate measurements, galvanic coupling, and surface potential mapping. In the anodic polarization tests, pure tungsten and the four

2020年12月1日 · The corrosion behavior of W-Cu alloys, pure Cu and W at different pH was investigated using electrochemical measurements and immersion test. The corrosion behavior and the preferentially attacked phase of the W-Cu alloys changed with pH values as micro-galvanic effect between Cu binder and W phase played a significant role.

1998年11月1日 · Recently, advanced tungsten-metal (W-M) composites have been developed to improve their ballistic penetration, but the corrosion properties are unknown and need to be determined. In this work, the galvanic corrosion behavior of W coupled with several selected metals/alloys was investigated.

Active and galvanic corrosion during post-CMP cleaning is one of the critical problems that reduce the yield in semiconductor device fabrication. In this work, the galvanic corrosion between W and TiN under various conditions is evaluated and reduced with the addition of a combination of corrosion inhibitor and chelating agent.

2016年9月1日 · Localized galvanic corrosion at the tungsten (W) and titanium nitride (TiN) interface causes fatal defects (e.g., corrosion and pitting issues) in chemical mechanical planarization (CMP) process. In this study, we control the corrosion potential difference between W and TiN via mixing of two corrosion inhibitors in order to decrease those defects.

2016年9月16日 · Galvanic corrosion between tungsten (W) and the titanium nitride (T iN) barrier layer inevitably occurs during chemical mechanical planarization (CMP), which led to the various