Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip. Our immersion systems lead the industry in productivity, imaging and overlay performance for high-volume manufacturing of the most advanced Logic and Memory chips.

By creative use of different combinations of optical proximity correction (OPC), phase shift, immersion lithography, and multiple patterning, manufacturers have extended 193 nm lithography to produce feature sizes significantly below conventional expectations.

2021年12月21日 · DUV：深紫外线（Deep Ultraviolet Lithography） EUV：极深紫外线（Extreme Ultraviolet Lithography） 一、DUV技术由日本和荷兰独立发展： ArF干法后期两大路径之争，ArF湿法胜于F2。 2002年DUV技术在干法ArF后期演化成2条主要进化方向： 其一是用157nm的F2的准分子光源取代193nm的ArF光源。 该方法较浸没式ArF更为保守，代表厂商是尼康和佳能。 其二，采用台积电林本坚的方案，依然使用193nm的ArF光源，但是将镜头和光刻胶之间的介 …

EUV lithography represents a departure from earlier photolithography approaches used by the semiconductor industry in several important respects, particularly the light source. EUV lithography functions by using high-powered lasers to incinerate 50,000 tin drops (each of which measures 30 micrometers, or 30-millionths of a meter) per

2024年11月28日 · This Primer comprehensively explores the technical evolution from deep ultraviolet to extreme ultraviolet (EUV) lithography, highlighting innovative approaches in source technology, resist...

Deep Ultraviolet (DUV) Photolithography is the process of defining a pattern in a thin photosensitive polymer layer (photoresist) using controlled 254–193-nm light such that the resulting polymer pattern can be transferred into or onto the underlying substrate by etching, deposition, or implantation.

2025年2月3日 · More recently, deep UV and extreme UV lithography technologies have been developed to provide the deep subwavelength resolution required for the semiconductor chip industry. Nevertheless ...

2023年4月19日 · In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated silicon (100) surface in the absence of a photoresist. EUV lithography is the leading lithography tech...

2023年7月1日 · Extreme ultraviolet (EUV) lithography can directly pattern sub-20-nm half-pitch resolution, and it has emerged as the most promising nanoscale fabrication technology. However, the restricted brightness of the EUV light source and the limited reflectivity of multilayer mirrors impose new requirements for the sensitivity of photoresists.