资讯
Multiscale modelling and control of thin film deposition processes encompass advanced simulation techniques that integrate phenomena occurring over disparate spatial and temporal scales.
Atomic Layer Deposition (ALD): A vapour phase deposition process that utilises sequential, self-limiting reactions to form ultra-thin films with atomic-scale thickness control. Conformality ...
6 天
Tech Xplore on MSNMoS₂ thin films extend lifespan of anode-free solid-state batteries by seven-foldSouth Korean researchers have developed a technology that improves the lifespan of next-generation anode-free all-solid-state ...
Various thin-film deposition tools, including PVD (e-beam & thermal evaporators, DC & RF magnetron (reactive) sputterers) and CVD (APCVD of graphene, Si oxidation, PECVD of SiO2 and SiNx). Available ...
In this paper we report a method for 0-level encapsulation using thin films deposition at temperatures below 200°C. The packaging method allows the use of photoresist as sacrificial layer, which ...
Defect properties of undoped low-pressure chemical-vapor-deposited (LPCVD) polysilicon films have been investigated by capacitance techniques on a simple metal-oxide-semiconductor (MOS) capacitor ...
A dry process, piCVD is suitable for coating particles with diameters as small as 5 μm. ... Photo-initiated chemical vapor deposition of thin films using syngas for the functionalization of surfaces ...
6 天
Interesting Engineering on MSNBreakthrough tech boosts capacity retention in batteries by 7 times; triples runtimeThe Korea Research Institute of Chemical Technology's new MoS2 coating boosts the lifespan of anode-free solid-state ...
The company's research efforts are primarily customer-driven, with a strong emphasis on developing efficient, cost-effective sputtering technologies that support scalable, production-ready processes.
Thin Film Interconnect (TFI), based in Frederick, Maryland, is pleased to announce a strategic technology partnership with Heisler Semiconductor LLC, headquartered in Baltimore, Maryland. This ...
Silicon oxide (SiOx) and silicon nitride (SixNy) thin films of different thicknesses were deposited on the polyimide (PI, Kapton HN) film surfaces via plasma-enhanced chemical vapor deposition (PECVD) ...
Scientists across the world are working to make quantum technologies viable at scale—an achievement that requires a reliable ...
一些您可能无法访问的结果已被隐去。
显示无法访问的结果