Among its Semicon West related announcements, Applied is launching its Endura Integrated Copper Barrier/Seed (ICuBS) today, an Endura system that features a plasma vapor deposition (PVD) chamber and ...

In addition to RF PVD, the system’s flexible, high-productivity platform can be configured with a wide range of PVD, CVD 2 and ALD technologies, making it uniquely capable of fabricating all ...

Delivery of the ALD system marks a major step toward commercialising Adisyn’s next-gen chips. ... Read More The post New ALD ...

Alternative ALD or CVD seed and adhesion layer technologies ... For copper barrier-seed applications, Novellus' INOVA® NExT PVD system features a patented hollow cathode magnetron (HCM) IONX source ...

AVACO’s new ALD process system can provide a solution for buffer ... equipment and specializes in the manufacture of sputtering (PVD) vacuum deposition equipment (in-line, cluster, and roll ...

For GAA FETs, however, both PVD and CVD will be phased out from ... 2021 Logic Master Class introduced its 7-module system that includes ALD for deposition. At a significantly lower system cost ...

The Ioniq PVD system is an Integrated Materials Solution™ (IMS™) that includes surface preparation along with PVD and CVD processes in a single, high-vacuum system. Ioniq PVD enables ...

Beneq’s ALD system known as C2R achieves speeds of up to 200 rpm with ... “For example, think of a strongly curved, small aspheric lens. With classical PVD processes, it is nearly impossible to ...

The system's ALD chamber delivers an ultra-thin ... Vice President and General Manager of Applied Materials' Copper, PVD and Integrated Systems Product Business Group. "With its unique ability to ...