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电子工程专辑
11 年
稳懋在0.15μm pHEMT制程上的演进
在传统上, 0.15μm pHEMT制程是用在高频方面的应用。较少光罩层数的制程虽然带来较低的寄生电容的, 但也降低了对湿气的保护。为了要强化此一弱点,稳懋研发团队增加了一层称为湿度抵抗层(Enhanced Moisture Ruggedness -EMR)使此制程更加优化, 并在电容与湿气上 ...
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