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BARRINGTON, N.J. and PLAINVIEW, N.Y., June 28, 2018 (GLOBE NEWSWIRE) -- Edmund Optics ®, the world’s leading supplier of optical components, has ordered the SPECTOR ® Ion Beam Sputtering ...
The basic Dual Ion Beam Sputtering (DIBS) chamber set up as comprises an etching source that precisely directs a neutralised ion beam onto a wafer located in the substrate holder. Normally, for good ...
In the present state of the art, ion beam sputtering is used to produce low-loss dielectric optics. During the manufacturing of a dielectric layer stack, the deposition material must be changed ...
A method of ion beam sputtering fluoride films suitable for a production environment using a commercially available dual ion beam sputtering system is presented in this work. The resulting optical and ...
Since its founding in 2007, the LZH spin-off has focused on the development and construction of ion beam sputtering coating systems. Highlights of LZH and CEC LZH presents innovative coating ...
a, Sputtering removes material from a free-standing Si 3 N 4 membrane with a cavity. b, Feedback-controlled ion-beam sculpting apparatus housed in a high-vacuum chamber.a, A 500-nm-thick low ...
Denton’s bias target ion beam sputtering technology is unique, providing collimated, ultra-uniform films for fill and planarization.
Veeco Instruments has announced that it has shipped its Spector Ion Beam Sputtering (IBS) system and Sirius Optical Monitor System to the Fraunhofer Institute for Telecommunications (HHI).. The ...
As well as this it is clear that the capability to generate ions with 20 keV energy results in greater ion yield for PLGA. Figure 4. Sputter yields for Ar 1000 + at a range of primary beam ...
Since the ion beam sputter rate scaled inversely with binding energy, it implied a significant decrease. Therefore, the authors measured the shift in sputter rate caused by the gas and the plasma to ...
FIB milling is limited by the ion beam size and ion-sample interaction volume. Material Removal vs. Addition: FIB milling primarily focuses on material removal through sputtering, while AFM-based ...
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