Anisotropic etching and bulk micromachining of silicon are critical processes in the fabrication of micro-electromechanical systems (MEMS) and other microstructures. These techniques allow for the ...

Recent studies have demonstrated that using anisotropic etching of silicon can create gratings with sharp, atomically smooth facets, leading to a remarkable increase in peak order efficiency and a ...

Abstract: In this review article, various aspects of plasma etching for very large scale integrated (VLSI) circuit technology are presented. The motivation for using plasma etching and the advantages ...

Department of Physics and Astronomy, University of Wyoming, Laramie, Wyoming 82071, United States Center for Quantum Information Science and Engineering, University of Wyoming, Laramie, Wyoming 82071, ...

Challenges like higher selectivity and precise etching are critical for angstrom-scale IC production. Advanced RF pulsing and plasma control enhance precision in sub-nanometer processes.

Department of Mechanical Science and Engineering, Grainger College of Engineering, University of Illinois Urbana−Champaign, Urbana 61801 Illinois, United States Materials Research Laboratory, ...