High-NA EUV makes progress toward high-volume manufacturing while optical lithography sees continued advances.

Semiconductor Photomask Market size is expected to reach USD 8,659 billion by 2034, projected at a CAGR of 5.8% during ...

At close: March 13 at 3:59:07 PM EDT Loading Chart for SHECY ...

Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...

To mitigate these issues, researchers are refining multi-beam mask writers, high-transparency pellicles, and pushing toward defect-free mask blanks. Multi-beam electron-beam mask writing technology ...

Biofilm pellicles were cultivated in a modified MSgg medium, which provided increased carbon and nitrogen availability while reducing buffering agents. This modification accelerated biofilm ...

Department of Prosthodontics and Periodontology, Piracicaba Dental School, Universidade Estadual de Campinas (UNICAMP), Av. Limeira, 901, Piracicaba, São Paulo 13414-903, Brazil ...