according to which MAPPER will ship its first 300 mm multiple-electron-beam maskless lithography platform for process development and device prototyping to TSMC. This platform gives TSMC the ...
CDU is a major contributor to yield drop out in deep sub micron technologies and a big concern to the lithography process. Both the Intra field and the inter field type of CD variations can be ...
Compared with optical lithography, NIL is a far simpler process. Optical lithography requires high-power excimer lasers and complex stacks of precision-ground lens elements to project nanometre ...
The annual Nick Cobb scholarship recognizes an exemplary graduate student working in the field of lithography for semiconductor manufacturing. The award honors the memory of Nick Cobb, who was an SPIE ...