Anisotropic Wet Etching for Advanced 3D Structures The demand for three-dimensional semiconductor architectures has necessitated improvements in anisotropic wet etching techniques. Modern formulations ...

Wet chemical etching of silicon has been a topic of significant interest due to its importance in microelectromechanical systems (MEMS), nanotechnology, and semiconductor device fabrication. Many ...

This work demonstrates an anisotropic wet etching process of (100)-silicon wafers for the realization of compact mesa structures under deep etching conditions. Utilizing specially designed 100-beam ...

This article deals with the dependence of the silicon etch rate close to the h 111i orientation when etching in anisotropic etching solutions such as aqueous KOH and EDP‡. In these solutions the etch ...

Fig. 3: Isotropic or multidirectional etch (top) vs. anisotropic or directional etch (bottom) Source: Wikipedia. ALE vs. selective etch Highly-selective etch is required for many advanced chips. Over ...

Abstract: This paper presents the study of silicon microneedles patterns of formation by a method of anisotropic wet chemical etching in potassium hydroxide solution. Anisotropic etching speed ...

Anisotropic wet etching is very selective to crystallographic orientation of silicon. Although, on the one hand, this allowed us to realize atomically flat surfaces and reduce propagation loss through ...

Figure 2 outlines the fabrication steps used in this work for realizing waveguides and grating couplers using anisotropic wet etching process. We used a [110]-oriented SOI substrate with 340-nm thick ...