Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

[Zach] decided to use his electron microscope as an e-beam litho machine; although not designed for lithography, it has the same basic components as a real EBL machine and can act as a substitute ...

(Image: Fraunhofer Society) Block copolymer lithography has been explored for the fabrication of high-density nanoscale patterns for semiconductor devices, such as transistors, memory devices, and ...