The generous terms reflect how China is sparing no effort to entice young talent to boost the nation’s capabilities in lithography systems.

China is set to mass-produce complex EUV systems as early as 2026. However, this does not seem particularly realistic.

Huawei, SMIC reportedly advancing LDP lithography, eye 3Q25 trial, 2026 rollout China is making significant strides in ...

Naura Technology, which has been actively acquiring and restructuring since 2015, is gradually assembling a comprehensive ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel ...

Delft, The Netherlands / Hsinchu, Taiwan -- Ocotober 13, 2008 -- MAPPER Lithography and Taiwan Semiconductor Manufacturing Company (TSMC) signed an agreement, according to which MAPPER will ship its ...

The introduction of nanovoxelated elastic moduli in materials fabrication offers new possibilities for 3D printing, enhancing ...

Irresistible Materials, Ltd (IM), a leader in the development of novel resist materials for extreme ultraviolet (EUV) ...

China invests billions to create its own machines, while Canon bets on innovation to threaten Asml dominion in the global market In a quiet Dutch city named Eindhoven, is the headquarters of ASML, ...