Working at i-line (λ=364nm), with standard novolak resists, we have demonstrated features as small as 50 nm. The processing has been developed and demonstrated with an interferometric lithography tool ...

FZ Jülich is researching how this radiation can be used for EUV interference lithography. ASML's EUV imagesetter Twinscan NXE:3400 from the inside. A laser shoots plasma droplets to generate ...

In such media, grains vary slightly in size, shape, and exact positioning, which introduces noise and interference and ... the disk into isolated bits using lithography or other processes ...