Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

By way of example, TSMC's N3E node as used in the latest Apple chips has gate pitch of at minimum 45 nm and a metal pitch of ...

Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...

The move was a shift in strategy for Intel, which lagged rivals in adopting the previous generation of extreme ultraviolet (EUV) lithography machines. It took Intel seven years to put those ...

These are the most-read DIGITIMES Asia stories from the week of March 17 – March 22.

Huawei, SMIC reportedly advancing LDP lithography, eye 3Q25 trial, 2026 rollout China is making significant strides in ...

Intel has achieved a significant technological milestone with the successful deployment of two cutting-edge ASML lithography machines in its manufacturing facilities. The new High-NA machines have ...

Intel, the first chipmaker to receive ASML’s latest high NA lithography machines, has produced 30,000 silicon wafers in a single quarter using the technology Intel has declared that the first ...

Discover why ASML dominates the lithography market with 90% DUV share, strong R&D, and robust growth prospects amid ...