Since the 1980s, cutting-edge lithography has shifted from the 365 nm 'i-line' of mercury vapour lamps to deep-ultraviolet light from excimer lasers at 248 nm (krypton fluoride lasers) and 193 nm ...

lithography involves wavelengths of 13.5 nm, and thus represents the next significant step in the reduction of feature sizes on integrated circuits. However, the move from 193 nm excimer laser ...

The Chinese Academy of Sciences has developed a light source that produces 193-nm DUV light, but it is years away from ...

Scientists from the Chinese Academy of Sciences (CAS) have reportedly made a major ‘breakthrough’ in solid-state ...

A new solid-state laser produces 193-nm light for precision chipmaking and even creates vortex beams with orbital angular ...

Researchers from the Chinese Academy of Sciences achieved a breakthrough in deep ultraviolet (DUV) laser technology by ...

Researchers from the Chinese Academy of Sciences recently achieved a breakthrough by creating a compact, solid-state laser ...

are essential in various fields such as semiconductor lithography, high-resolution spectroscopy, precision material processing, and quantum technology. These lasers offer increased coherence and ...

Researchers at the Chinese Academy of Sciences (CAS) have developed a solid-state deep ultraviolet (DUV) laser that emits 193nm light in lab conditions—a wavelength critical for semiconductor ...

STRATA Skin Sciences announces a study validating its Excimer Laser technology's superiority in treating dermatological conditions compared to traditional UVB sources. STRATA Skin Sciences ...