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In a conventional plasma etching chamber, the incident ions bombard the ... rough and irregular surfaces in practice. Nevertheless, dry adhesives have numerous applications in nanoelectronics ...

Both capacitively (RIE) and inductively (ICP) coupled plasma etcher with fluorine-based gases (CF4, CHF3, C4F8, SF6), BCl3, nitrogen, argon, and oxygen for anisotropic dry etching of Si-based ...